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Wintel Corporation
About us
CEO Message
Company overview
Our Creed
History
R&D History
Organization chart
Location
Products
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
R&D
Technology
Patente & Certification
Contact US
한국어
English
Wintel Corporation
About us
CEO Message
Company overview
Our Creed
History
R&D History
Organization chart
Location
Products
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
R&D
Technology
Patente & Certification
Contact US
한국어
English
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Wintel Corporation
한국어
English
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
Poly Etcher
WINTEL'S PRODUCTS
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
Pattern Uniformity Result Image
Pattern Uniformity Result Image
Application : DPT, QPT, Hard mask etch etc.
Excellent Uniformity <1% (Concentric profile)
Improved wafer edge uniformity : Wide plasma generation
Good zone controllability of uniformity (Quadrant)
