Notice
Back
Notice setting
Back
More
Post notices
Post reactions
You will be notified when a comment or reply is made to a post or comment that you have made.
Announcements
Real-time notification of important announcements from the site will be provided.
Alarm
My Page
Log out
한국어
English
About us
CEO Message
Company overview
Our Creed
History
R&D History
Organization chart
Location
Products
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
R&D
Technology
Patente & Certification
Contact US
Close
Site logo
About us
CEO Message
Company overview
Our Creed
History
R&D History
Organization chart
Location
Products
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
R&D
Technology
Patente & Certification
Contact US
한국어
English
Site logo
About us
CEO Message
Company overview
Our Creed
History
R&D History
Organization chart
Location
Products
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
R&D
Technology
Patente & Certification
Contact US
한국어
English
MENU
Site logo
한국어
English
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
Poly Etcher
WINTEL'S PRODUCTS
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
Pattern Uniformity Result Image
Pattern Uniformity Result Image
Application : DPT, QPT, Hard mask etch etc.
Excellent Uniformity <1% (Concentric profile)
Improved wafer edge uniformity : Wide plasma generation
Good zone controllability of uniformity (Quadrant)
