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LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
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EER
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Our Creed
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R&D History
Organization chart
Location
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LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
R&D
Technology
Patente & Certification
Contact US
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About us
CEO Message
Company overview
Our Creed
History
R&D History
Organization chart
Location
Products
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
R&D
Technology
Patente & Certification
Contact US
한국어
English
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한국어
English
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
EUV
WINTEL'S PRODUCTS
LPR (Low-Pressure Removal)
PE ALD
Poly Etcher
HARC
Doped ACL
EER
EUV
Key Technologies
① Chamber contamination free
② High selectivity
③ rework rate: >10 times
④ Design to under layer strip
